|
View
| 3D MF Probestation | 492 | Metrology | In-house | Medium Field MR and RF Probe Station |
|
View
| 4-Point | 5601 | Metrology | Four Dimensions, Inc | Model 280 |
|
View
| 5175 DS-1 | 5219 | Wet process benches | burdinola | OR-ST 1500 |
|
View
| 5175 DS-2 | 5220 | Wet process benches | burdinola | OR-ST 1500 |
|
View
| 5175 DS-3 | 5221 | Wet process benches | burdinola | OR-ST 1500 |
|
View
| 5269 DS-1 | 5222 | Wet process benches | burdinola | OR-ST 1500 |
|
View
| 5269 DS-2 | 5223 | Wet process benches | burdinola | OR-ST 1500 |
|
View
| 5269 DS-3 | 5224 | Wet process benches | burdinola | OR-ST 1500 |
|
View
| 5269 DS-4 | 5225 | Wet process benches | burdinola | OR-ST 1500 |
|
View
| 5269 DS-5 | 5226 | Wet process benches | burdinola | OR-ST 1500 |
|
View
| 5269 DS-6 | 5227 | Wet process benches | burdinola | OR-ST 1500 |
|
View
| 5269 DS-7 | 5228 | Wet process benches | burdinola | OR-ST 1500 |
|
View
| Activator | 388 | Thermal processes | Centrotherm | Activator 150 (SiC anneal) |
|
View
| AFM/SPM CellKraft Humidifier Albanova | 129 | Metrology | CellKraft | P2 |
|
View
| AFM/SPM IPS Bipotentiostat Albanova | 130 | Metrology | IPS | PGU-BI 1000 |
|
View
| AFM/SPM Nanow.JPK2 Albanova | 113 | Metrology | JPK Instruments | Nanowizard 3 |
|
View
| AFM/SSRM | 456 | Metrology | Veeco/Digital Instruments | NanoScope Dimension 3100 |
|
View
| AGM | 491 | Metrology | Princeton Measurement Corporation | 2900-02 Alternating Gradient Magnetometer |
|
View
| AJA 2 Sputter Albanova | 114 | Thin film deposition | AJA International Inc. | Orion |
|
View
| AJA 3 Sputter Albanova | 107 | Thin film deposition | AJA International | ATC Orion-8 |
|
View
| AJA evaporator Albanova | 140 | Thin film deposition | AJA international Inc. | ATC1800 |
|
View
| AJA ion beam etching Albanova | 139 | Dry etching | AJA international Inc. | AJA ion miller |
|
View
| AJA Sputter Albanova | 104 | Thin film deposition | AJA International Inc. | Orion |
|
View
| ALD | 570 | Thin film deposition | BENEQ | TFS200 |
|
View
| ALS-stepper | 581 | Lithography | GCA/Ultratech | ALS 2035 G-line |
|
View
| Annealer vacuum Albanova | 134 | Thermal processes | Moorfield | Anneal |
|
View
| APL-HMDS | 3721 | Lithography | YES-5E | Vacuum Bake / Vapour Prime Processing System |
|
View
| Ariel | 537 | Dry etching | Oxford Plasma Technology | Plasmalab80Plus (Oxford RIE System) |
|
View
| AS-One RTP | 571 | Thermal processes | Annealsys | AS-One |
|
View
| Asterix | 551 | Epitaxy | Aixtron AIX 200/4 | Movpe |
|
View
| Atomic Absorption Spectrometer | 164 | Metrology | Thermco Fisher | Thermo iCE 3000 |
|
View
| Bake 2 | 5642 | Lithography | Bake oven Despatch | Pre and postprocessing of samples |
|
View
| Bake 3 | 5643 | Lithography | Bake oven Memmert | Pre and postprocessing of samples |
|
View
| Bake 4 | 5074 | Lithography | Memmert | U 26 |
|
View
| Bake 5 | 5075 | Thermal processes | Memmert | U 26 |
|
View
| Bake 6 | 5076 | Lithography | Despatch | Oven |
|
View
| Bake 7 | 3722 | Lithography | Nabertherm | Ramp able |
|
View
| Balance | 5606 | Other processes | Balance | Våg |
|
View
| Barbara | 511 | Thin film deposition | Provac | PAK 600 Coating System |
|
View
| Beamer computer Albanova | 133 | Lithography | GeniSys GmbH | Version 5.90 |
|
View
| Bergman Labora Inspection Microscope | 578 | Metrology | Nikon | L |
|
View
| Bergman Labora NIS-Computer | 5781 | Metrology | Intel | Intel Xeon 2245 3.9GHz, Nvidia Quadro RTX5000 8GB |
|
View
| Bläster | 5004 | Other processes | Guyson Europlast | 4 SF-Select (med inställbar hjöd) samt utsugningsf |
|
View
| Bond Tester DAGE | 466 | Metrology | DAGE | 2400PC |
|
View
| Bonder | 542 | Device mounting | Karl Suss | CB8 Substrate Bonder |
|
View
| Box furnace | 219 | Thermal processes | CARBOLITE | CWF 1200 |
|
View
| Brage | 303 | Wet process benches | PM Plast | Fume hood |
|
View
| Calib | 426 | Other processes | - | - |
|
View
| Canon EOS 350D | 4541 | Surface analysis & TEM | Canon | EOS 350D 100mm Macro |
|
View
| CD SEM | 363 | Surface analysis & TEM | Hitachi | S-3400N & EDS QUANTAX 200 |
|
View
| Centrifuge Z 200 A | 213 | Sample prep | HERMLE | Z 200 A |
|
View
| Centrifuge Z 323 | 214 | Device mounting | HERMLE | Z 323 |
|
View
| CIPT | 495 | Metrology | Smartip | CIPTech |
|
View
| Cleanroom | 4500 | Other processes | Electrum | Electrum Laboratory |
|
View
| CMP | 489 | Other processes | IPEC / Axus | Avanti 472 |
|
View
| CNC-milling machine | 154 | Other processes | Minitech | Mini-Mill |
|
View
| CnCV | 1405 | Metrology | SEMILAB | 210 |
|
View
| CO2 Laser | 158 | Other processes | Universal Laser Inc. | VSL 2.3 |
|
View
| Cobra ICP-RIE Albanova | 135 | Dry etching | Oxford Instruments | Plasmapro 100 Cobra 300 |
|
View
| CPD | 159 | Other processes | tousimis | Automegasamdris-938 |
|
View
| Critical Point Dryer Albanova | 112 | Other processes | Leica | EM CPD 300 |
|
View
| Cryo RIE Albanova | 106 | Dry etching | Oxford | Plasmalab 100 |
|
View
| Cryogenic Probestation | 447 | Metrology | Janis | ST-500-UHT |
|
View
| Dektak | 362 | Metrology | ST | Dektak3ST |
|
View
| DektakXT Stylus Profilometer | 502 | Metrology | Bruker | DektakXT |
|
View
| Diamond saw | 5203 | Sample prep | Buehler | Isomet low speed saw |
|
View
| Differential scanning calorimetry (DSC) | 203 | Metrology | TA Instruments | 2920 modulated DSC |
|
View
| Dimple grinder | 5206 | Sample prep | Gatan | Dimple grinder |
|
View
| Disco cleaner | 3760 | Sawing | Disco | DCS1441 |
|
View
| Disco DAD saw | 465 | Sawing | Disco | DAD 320 |
|
View
| Disco-saw | 375 | Sawing | Disco | DAD3241 |
|
View
| DPT Device | 423 | Other processes | Hollander Research | SiC power discretes |
|
View
| DPT-PM | 424 | Other processes | Hollander Research | SiC power modules |
|
View
| DynaCool PPMS Albanova | 136 | Metrology | Quantum Design | Dynacool |
|
View
| Dynatronix Pulse Power Supply | 161 | Metrology | Dynatronix | DuPR10-.1-.3XR |
|
View
| Ebeam litho Albanova | 100 | Lithography | Raith GmbH | Raith Voyager |
|
View
| EDS | 305 | Surface analysis & TEM | Hitachi | SU8230 |
|
View
| Edwards Auto 306 Albanova | 122 | Thin film deposition | Edwards | Auto306 with FL400 chamber |
|
View
| Electrolyte polishing | 5207 | Sample prep | Fischione | Electrolyte polishing |
|
View
| Emma | 524 | Lithography | Karl Suss | MA6/BA6 |
|
View
| Empyrean | 562 | Metrology | PANalytical B.V. | Empyrean multipurpose high resolution X-ray diffra |
|
View
| Endura | 588 | Thin film deposition | Applied Materials | PVD |
|
View
| Epsilon2000 SiGe epitaxy | 572 | Epitaxy | ASM200 | Si-epi |
|
View
| Esa | 536 | Dry etching | Oxford Plasma System | Plasmalab80Plus (Oxford RIE System) Chamber B |
|
View
| ESEC Automatic Wirebonder | 156 | Device mounting | ESEC | 3100 plus |
|
View
| Evercool PPMS Albanova | 138 | Metrology | Quantum Design | Evercool II |
|
View
| External chemistry lab | 4501 | Other processes | N/A | N/A |
|
View
| Fabio | 535 | Dry etching | Oxford Instrument | ICP380 Etch System |
|
View
| FE-TEM | 468 | Surface analysis & TEM | JEOL | JEM 2100F(HR), JEOL Electron Microscope 2100 Field |
|
View
| FH APL | 3731 | Wet process benches | Fume hood | Fume hood |
|
View
| FH APL-gul | 3724 | Lithography | PM Plast | Dragskåp |
|
View
| FH epi service | 5040 | Wet process benches | PM Plast | Dragskåp för epi rengöring |
|
View
| FH Gul3 | 5071 | Lithography | PM Plast | Dragskåp |
|
View
| FH III/V | 5034 | Wet process benches | PM Plast | Dragskåp |
|
View
| FH MS Nikon | 1372 | Device mounting | Labrum klimat | LAF |
|
View
| FH MS Olympus | 1371 | Device mounting | Labrum klimat | LAF |
|
View
| FH Service | 5049 | Wet process benches | PM plast | Fume hood for service |
|
View
| FH wet chemistry-1 | 5041 | Wet process benches | PM Plast | Dragskåp solvent & acid (for service work) |
|
View
| FH wet chemistry-2 (solvent) | 5042 | Wet process benches | PM Plast | Dragskåp solvent |
|
View
| FH wet chemistry-3 | 5043 | Wet process benches | PM Plast | Dragskåp solvent and acid |
|
View
| FH wet chemistry-4 | 5044 | Wet process benches | PM Plast | Dragskåp solvent |
|
View
| FH wet chemistry-5 (solvent) | 5045 | Wet process benches | PM Plast | Dragskåp solvent |
|
View
| FH wet chemistry-6 | 5046 | Wet process benches | PM Plast | Dragskåp solvent |
|
View
| FH wet chemistry-7 | 5047 | Wet process benches | PM PLast | Dragskåp |
|
View
| FH wet chemistry-8 | 5048 | Wet process benches | PM Plast | Dragskåp |
|
View
| FIB/SEM Albanova | 101 | Surface analysis & TEM | FEI Company | Nova 200 |
|
View
| Fiber anneal | 1506 | Other processes | Ångpaneföreningen | Special design |
|
View
| FIB-SEM | 467 | Surface analysis & TEM | FEI | QUANTA 3D FEG |
|
View
| Fluorescence Spectrometer (PL) | 206 | Metrology | Perkin Elmer | LS55 |
|
View
| Formlabs SLA printer 1 | 165 | Other processes | Formlabs | Form 3 |
|
View
| Formlabs SLA printer 2 | 166 | Other processes | Formlabs | Form 3 |
|
View
| Fourier Transform Infrared (FTIR) | 204 | Metrology | Thermo Scientific | Nicolet iS10 |
|
View
| Freeze Dryer | 210 | Metrology | Ilshin Lab | Ilshin |
|
View
| Frej | 301 | Epitaxy | Aixtron | Flip Top CCS MOVPE System |
|
View
| Freja | 302 | Surface analysis & TEM | Hitachi | SU8230 |
|
View
| Fs Laser system 1 | 5216 | Other processes | Coherent | Mira 900 |
|
View
| Fs Laser system 2 | 5217 | Other processes | Coherent and APE | Chameleon Ultra II + APE Harmonics generator |
|
View
| FTIR Albanova | 142 | Surface analysis & TEM | Thermofischer | nicolet iS 50 FT-IR |
|
View
| FTIR Spectrometer | 448 | Metrology | Bruker | Vortex 70 V |
|
View
| Gallus | 534 | Dry etching | Oxford Instrument | ICP380 Etch System (GaAs & InP) |
|
View
| Gamma Photoresist Coater/Developer | 579 | Lithography | Suss Microtec | Gamma 4M |
|
View
| Gas Gromatography /Mass Spectrometry (GC/MS) | 223 | Metrology | Hewlett Packard | HP 6890 |
|
View
| Gemini | 569 | Surface analysis & TEM | Zeiss | Ultra 55 |
|
View
| Gold sputter FNM | 5202 | Sample prep | JEOL | Ion sputter JFC-1100 |
|
View
| Grinder-polisher | 5204 | Sample prep | Buehler | Vector/Alpha |
|
View
| Hall | 455 | Metrology | Varian/Keithly | In-house |
|
View
| HB16-TPT wire bonder | 590 | Device mounting | TPT | HB16 |
|
View
| Helios 5 UC FIB/SEM Albanova | 141 | Surface analysis & TEM | FEI | Helios 5 UC |
|
View
| HF Probestation | 493 | Metrology | In-house | High Field RF Characterization Station |
|
View
| HMDS 2 | 5073 | Lithography | IMTEC | Star 2000 (HMDS) |
|
View
| HR X-Ray | 561 | Metrology | X-Ray | X-Ray |
|
View
| ICP | 533 | Dry etching | STS | ICP DRIE (Si, SiO2) |
|
View
| ICPCVD | 538 | Thin film deposition | Oxford Plasma Technology | PlasmaPro 100 |
|
View
| IDP | 472 | Thin film deposition | Expertech | LPCVD furnace |
|
View
| Indira | 516 | Thin film deposition | Balzers | BA 510 Thermal Evaporator |
|
View
| Inductively Coupled Plasma Emission Spectrometry (ICP-OES) | 200 | Metrology | Thermo Scientific | iCAP 6500 |
|
View
| Ion Chromatography (IC) | 207 | Metrology | Metrohm | Eco IC |
|
View
| Ion polishing | 5208 | Sample prep | Gatan | Precision ion polishing 691 |
|
View
| Iwatsu | 421 | Other processes | Iwatsu | I-V 5KV 400A |
|
View
| Karl Suss | 521 | Lithography | Karl Suss | Mask aligner MA8/BA8 |
|
View
| KDF | 519 | Thin film deposition | KDF | 844GT |
|
View
| Keithley Parameteranalyser | 3502 | Metrology | Tektronix | 4200A-SCS |
|
View
| Kemvåg | 5017 | Metrology | ? | ? |
|
View
| Keysight | 422 | Other processes | Keysight | B5105B |
|
View
| Kyl & frys | 5078 | Other processes | Electrolux | Kylskåp/frys |
|
View
| Lab support | 450 | Other processes | ELAB | Virtual tool |
|
View
| Laboratory oven | 5210 | Sample prep | Hereaus | Bench oven |
|
View
| LabRamHR Raman/mikro-PL-system | 226 | Metrology | Horiba | LabRamHR |
|
View
| Labspin 82 | 527 | Lithography | Suss Microtec | Labspin8 BM |
|
View
| Labspin80 | 522 | Lithography | Suss Microtec | Labspin8-BM |
|
View
| LEITZ | 5014 | Metrology | LEITZ MPV-SP | Thin film interferometry, |
|
View
| Light Soaker | 222 | Other processes | Wavelabs | Wavelabs |
|
View
| LIMS | 5001 | Other processes | Elab | Access |
|
View
| LPE 106 | 1404 | Epitaxy | LPE | PE106 |
|
View
| Läcksökaren | 5005 | Other processes | Pfeifer | QualyTest HLT260 |
|
View
| M01 Olympus | 3726 | Surface analysis & TEM | Olympus | BX60M |
|
View
| M02 Olympus/camera | 3711 | Surface analysis & TEM | Olympus | BX60 |
|
View
| M03 Leica | 3712 | Surface analysis & TEM | Leica | Microscope |
|
View
| M05 Nikon/auto | 5012 | Surface analysis & TEM | Nikon | Microscope |
|
View
| M07 Olympus/camera | 5018 | Surface analysis & TEM | Olympus | Microscope |
|
View
| M08 Leitz/camera | 5061 | Surface analysis & TEM | Leitz | Microscope with camera |
|
View
| M09 Nikon/camera | 5062 | Surface analysis & TEM | Nikon | Microsocpe with camera |
|
View
| M10 Nikon/auto | 5603 | Surface analysis & TEM | Nikon | Microscope (motorized objectives) |
|
View
| M11 Nikon/CD 1 | 5602 | Metrology | Nikon | OPTISHOT/Linjebreddsmätare |
|
View
| M13 Nikon/camera | 5612 | Surface analysis & TEM | Nikon | Nikon |
|
View
| M14 Olympus/camera | 5064 | Surface analysis & TEM | Olympus | BX60 |
|
View
| M20 Microscope | 5209 | Sample prep | Nanometrics | Microscope |
|
View
| Manual probstation | 5013 | Metrology | Suss Microtech | 10500006 (probe station) |
|
View
| Mariana | 593 | Dry etching | SPTS | Rapier |
|
View
| Masktvätt | 5644 | Lithography | Ultra t Equipment Company, Inc. | SCS 124 |
|
View
| Maximus | 523 | Lithography | SSE | Maximus 804 |
|
View
| Megasonic bath | 5059 | Wet process benches | PCT | PCT 24 wet bench |
|
View
| Micro Diamond Scriber, Albanova | 132 | Device mounting | OEG GmbH | MR-200 |
|
View
| Microwave/THz Probe Station | 3501 | Metrology | MST | MST Lab |
|
View
| MLA150 Albanova | 128 | Lithography | Heidelberg Instruments GmbH | MLA150 |
|
View
| MLA150_Electrum | 594 | Lithography | Heidelberg Instruments | MLA150 |
|
View
| MS01 Nikon | 5063 | Surface analysis & TEM | Nikon | Stereo microscope SMZ-2B |
|
View
| MS02 Nikon | 5613 | Surface analysis & TEM | Nikon | Stereo microscope SMZ-2T |
|
View
| MTP | 577 | Device mounting | X'Display | MTP-1002 |
|
View
| Multi vessel dip coating unit | 217 | Sample prep | Aoxicindia | Xdip.MVI |
|
View
| Nanna | 304 | Wet process benches | PM Plast | Fume hood |
|
View
| Nanoscribe | 160 | Other processes | Nanoscribe | 3D Microfabrication System Photonic Professional G |
|
View
| Napoleon | 1403 | Epitaxy | Aixtron | VP508GFR SiC epi |
|
View
| Nikon Microphot-FXA | 153 | Other processes | Nikon | Microphot-FXA |
|
View
| NSR i-line stepper | 589 | Lithography | Nikon | TFHi12 |
|
View
| Obelix | 1552 | Epitaxy | Aixtron | LP-VPE 2106 |
|
View
| Opt. micr. 1, Albanova | 124 | Surface analysis & TEM | Nikon | ME600 |
|
View
| Opt. micr. 2, Albanova | 125 | Surface analysis & TEM | Nikon | ME600 |
|
View
| Opt. micr. 3, Albanova | 126 | Surface analysis & TEM | Nikon | Eclipse L200 |
|
View
| Opt. micr. 4, fluorescence, Albanova | 127 | Surface analysis & TEM | Nikon | ME600 w. fluorescence unit |
|
View
| Optical microscope (Leica) | 221 | Sample prep | LEICA DMLM | Leica |
|
View
| Optical profilometer | 454 | Metrology | Veeco | Wyko NT9300 |
|
View
| Orbis, Vapor HF etch | 592 | Dry etching | memsstar | Orbis Alpha |
|
View
| P5000 RIE/PECVD cluster | 587 | Dry etching | Applied Materials | Precision 5000 Mark II (Dielectric, MxP, CVD) |
|
View
| Paroteq Bonder Albanova | 116 | Device mounting | Paroteq GmbH | H-system |
|
View
| Particle sizer-DLS/Zeta potential | 201 | Metrology | Beckman Coulter | Delsa Nano |
|
View
| Parylene coater | 157 | Thin film deposition | SCS | PDS 2010 |
|
View
| Pekka | 518 | Thin film deposition | Plasmalab | 80Plus (Oxford PECVD System) Chamber A |
|
View
| Peo | 540 | Thermal processes | PEO | PEO-603 Anneal furnace III/V (ramp) |
|
View
| Plasma cleaner | 5201 | Sample prep | Fischione | Plasma cleaner |
|
View
| Plasmatvätt Pico | 1380 | Dry etching | Diener PICO RF | Low pressure plasma etcher |
|
View
| PLD | 20120509 | Thin film deposition | Neocera Inc | Neocera Pioneer 180 UHV PLD |
|
View
| Potentiostat / Galvanostat - ZRA | 208 | Metrology | GAMRY Instruments | VistsShield/Interface 1010 |
|
View
| Precision ion polishing system | 216 | Sample prep | Gatan | model 691 |
|
View
| Preparation lab | 469 | Sample prep | Collection of tools | Tools for sample preparation |
|
View
| Probestation 1 Manual | 457 | Metrology | Cascade | 11000 |
|
View
| Probestation 3 Semi Automatic | 459 | Metrology | Cascade Microtech | Cascade 12000 |
|
View
| Probestation 4 High Temp. | 453 | Metrology | Signatone | S-1060 |
|
View
| Profiler Albanova | 120 | Metrology | KLA-Tencor | P7 |
|
View
| Prometeus auto | 441 | Metrology | Karl Suss and Temptronic TermoChuck System | Automatic Probestation PA 150 and TP03215B-3300-2 |
|
View
| Prometeus manual | 440 | Metrology | Karl Suss and Temptronic TermoChuck System | Manual Probestation PM 5, TP0314A |
|
View
| PXI | 162 | Metrology | National Instruments | NI PXI-1033 Series |
|
View
| Quickseal | 5591 | Other processes | Quickseal | Inplastning |
|
View
| R/D 3 | 5033 | Wet process benches | Verteq | Verteq |
|
View
| R/D double | 5058 | Wet process benches | Semitool | Semitool Double 870S |
|
View
| R/D Gold | 5057 | Wet process benches | FSI Phoenix | FSI Phoenix 4" Au/Lift-Off |
|
View
| R/D Gul1 | 5023 | Wet process benches | FSI Phoenix | FSI Phoenix 4" |
|
View
| Raman Spectrometer HORIBA iHR 550 | 5214 | Metrology | HORIBA Jobin Yvon | iHR 550 |
|
View
| Renrum | 5000 | Other processes | Elab | Access |
|
View
| RF Probe Station | 163 | Metrology | MST | MST Lab |
|
View
| RIE ICP O2/AR Albanova | 103 | Dry etching | Oxford | Plasmalab 80+ |
|
View
| Rinser 1 | 3733 | Wet process benches | Verteq | Verteq |
|
View
| Rinser 2 | 3725 | Wet process benches | Verteq | Verteq |
|
View
| RoomR | 5002 | Other processes | Elab | responsible |
|
View
| Rotating Tube Furnace | 209 | Thermal processes | Heraeus | thermicon P |
|
View
| Rotational Viscometer | 224 | Metrology | Anton Paar | Visco QC 100 |
|
View
| Rotavapor | 218 | Sample prep | BÜCHI | R-205 |
|
View
| Ruggedness tests | 429 | Other processes | TBD | TBD |
|
View
| Rörtvätt | 5003 | Other processes | KTH | handmade |
|
View
| Scanning near-field optical microscope (SNOM) | 5218 | Surface analysis & TEM | Max Born Institute with modifications at KTH | A home-made instrument |
|
View
| SCM | 425 | Other processes | - | - |
|
View
| Sentaurus | 1406 | Other processes | Synopsys | R-2020.09 |
|
View
| Skivthk | 5016 | Metrology | Mitutoyo | RDP transducer indicator E307-1 |
|
View
| SmartPrint Maskless Litho Albanova | 115 | Lithography | SmartForce Technologies | SmartPrint |
|
View
| Speed mixer | 152 | Other processes | MST | MST lab |
|
View
| Spintronics probestation | 452 | Metrology | custom built | Probestation with rotating 1 T electromagnet |
|
View
| SPM/AFM FastScan Albanova | 110 | Metrology | Bruker | Dimension FastScan |
|
View
| SPM/AFM Icon Albanova | 109 | Metrology | Bruker | Dimension Icon |
|
View
| SPM/AFM Nanowizard JPK Albanova | 111 | Metrology | JPK Instruments | Nanowizard 3 Bioscience AFM |
|
View
| SR2000N Sheet Resistance | 5607 | Metrology | MDC | SR2000N |
|
View
| SSE Sprayets | 1374 | Wet process benches | SSE | Sprayets |
|
View
| SSEC | 4890 | Wet process benches | Vecco | SSEC 3300 |
|
View
| STM 1 | 5212 | Surface analysis & TEM | Omicron | Omicron STM-1 |
|
View
| Surge current measurements | 428 | Other processes | TBD | TBD |
|
View
| T1-Oxide 1250C | 485 | Thermal processes | Thermco | 5200 |
|
View
| T2-Oxide 1250C | 486 | Thermal processes | Thermco | 5200 |
|
View
| T3-Gate ox | 487 | Thermal processes | Thermco | 5200 |
|
View
| T4-FGA | 488 | Thermal processes | Thermco | 5200 |
|
View
| Table-top sample sputter | 168 | Sample prep | SEC | MCM-100 |
|
View
| Table-top SEM | 167 | Surface analysis & TEM | SEC | SNE Alpha |
|
View
| Tegal | 573 | Dry etching | Plasmaline | B300RF |
|
View
| TEK 370A | 420 | Other processes | Tektronix | 370A |
|
View
| Tepla | 530 | Dry etching | TePla | 300 (Microwave Plasma Asher) |
|
View
| Testtool | 20090417 | Other processes | Test AB eller OY eller Ltd | Special |
|
View
| Testtool Electrum | 20120702 | Metrology | Electrum lab | model 1 |
|
View
| TGA/FTIR Interface | 225 | Surface analysis & TEM | Thermo Scientific | -- |
|
View
| Thermal Stream | 427 | Other processes | TBD | TBD |
|
View
| Thermogravimetry Analysis (TGA) | 202 | Metrology | TA Instruments | TGA Q500 |
|
View
| Theta Lite | 151 | Surface analysis & TEM | MST | MST lab |
|
View
| TLE lab | 5446 | Other processes | Tanner | 15.10 |
|
View
| Two speed grinder-polisher | 215 | Sample prep | BUEHLER | Alpha |
|
View
| UEM | 470 | Surface analysis & TEM | JEOL JEM-2100 | Ultrafast Electron Microscopy |
|
View
| uFAB Femtosecond Laser | 150 | Other processes | MST | MST lab |
|
View
| UHV SPM 3500 | 5213 | Surface analysis & TEM | RHK Technology | UHV SPM 3500 |
|
View
| Ultrasonic disc cutter | 5205 | Sample prep | Gatan | Model 601 |
|
View
| ULVAC photoresist stripper | 591 | Lithography | ULVAC | ENVIRO-1Xa |
|
View
| UVISEL Spectroscopic Ellipsometry | 557 | Metrology | HORIBA | UVISEL ER |
|
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| UVO Cleaner | 3713 | Sample prep | Jelight COmpany, Inc | 42-220 |
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View
| UV-Vis-NIR Spectrometer | 205 | Metrology | Perkin Elmer | Lambda-750 |
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View
| W2631 | 5031 | Wet process benches | Wet bench | Wet bench spray etch (GaAs). |
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| W3233 | 5032 | Wet process benches | Wet bench | Wet bench lift off. |
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| W34 | 5070 | Wet process benches | Wet bench | Wet bench Lithografi |
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| Vacuum Oven B&H | 212 | Thermal processes | Buch & Halm | VacuceII |
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View
| Wafer Inspection System | 503 | Surface analysis & TEM | Aeronca Electronics (Ceased), Estek | WIS150 |
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| Wetb Al etch | 5055 | Wet process benches | Wet bench | Etching |
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| Wetb APL | 5663 | Wet process benches | Wet bench | Wet bench |
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| Wetb APL-gul | 3723 | Wet process benches | Wet bench | Wet bench |
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| Wetb Au develop | 5022 | Wet process benches | Wet bench | Wet bench |
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| Wetb MEMS | 5051 | Wet process benches | Wet bench | TMAH, HF, KOH |
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| Wetb metal | 5053 | Wet process benches | Wet bench | Au/metal etch |
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| Wetb Sabina | 5077 | Wet process benches | PM Plast | 2 HP, Developer, Sink |
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| Wetb Si process | 5052 | Wet process benches | Wet bench oxide | Wet bench oxide,HF 1:10,BHF,HFmix |
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| Wetb Si strip | 5021 | Wet process benches | Wet bench developer | Photoresist processing. |
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| Wetb solvent | 5054 | Wet process benches | Wet bench | Remover, Vax, Au module |
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| Wetb Solvent clean | 3732 | Wet process benches | Wet bench | Substrate cleaning |
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| Wet-Chemistry | 96 | Wet process benches | Wet chemistry | Introduktion |
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| Wire bonder Albanova | 123 | Device mounting | Kulicke - Soffa | 4523D |
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| Woollam VASE Albanova | 137 | Metrology | J.A. Woollam | VASE Ellipsometer |
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View
| VT STM | 5211 | Surface analysis & TEM | Omicron | Omicron VT-STM |
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| Yes-ugn | 367 | Thermal processes | YES | Polyimide Bake Oven YES-450PB8-2/6-2 |
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| ZVA-24 Vector Network Analyzer | 155 | Metrology | MST | MST Lab |