Picture of W34
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Reza Nikpars
2nd Responsible:
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Description

Technical description

Full equipment name: Wet bench Lithografi W34
General purpose: Photoresist processing
Technical data:
• Chemicals: Acetone, HMDS, 351 developer, photoresist
• Hotplate
• HMDS tank
• 351 developer tank
• Nitrogen gun
• D.I. bubbler
• Aceton tank for cleaning of spincoater parts
• Sink for solvents incl. D.I. water tap
 

Details
Tool name:
W34
Area/room:
C-Gullan
Category:
Wet process benches
Manufacturer:
Wet bench
Model:
Wet bench Lithografi
Tool rate:
A
Instructors & Licensed Users

Instructors

Licensed Users

Tool Modes
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