Picture of RIE ICP O2/AR Albanova
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Erik Holmgren
2nd Responsible:
Adrian Iovan
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Description

Oxford Plasmalab 80+ RIE w. ICP.

Gases: oxygen and argon.

Info and Manuals.

Details
Tool name:
RIE ICP O2/AR Albanova
Area/room:
Albanova C1:3052
Category:
Dry etching
Manufacturer:
Oxford
Model:
Plasmalab 80+
Tool rate:
D
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