Technical description

Full equipment name: B.L.E Spinner & Hotplate Module W48
General purpose: Coating samples with photoresist films
Technical data:
• Wafer size up to 4 inch
• Spin speed range 500 - 4800 rpm
• Spin time range 0 - 60 seconds
• Interlock switch to protect spinning without vacuum or with lid open
• Programmable remote control unit