Technical description
 

Full equipment name: Tousimis Automegasamdri 938
 

General purpose: Automatic process cycle for drying upto five 1, 2, 4, 6 or 8 inch wafers per process run and multiple 10, 20, 30 mm chips per process run using super critical CO2.
 

Technical data: Sample medium used is Isopropanol.

Organic matter/Polymer is forbidden in CPD.