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ICPCVD (538)
Current status:
WARNING
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Responsibles
1st Responsible:
Magnus Lindberg
2nd Responsible:
Reza Nikpars
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Description
Details
Tool name:
ICPCVD
Area/room:
C-Q-Etch
Category:
Thin film deposition
Manufacturer:
Oxford Plasma Technology
Model:
PlasmaPro 100
Tool rate:
D
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