Tools
All tools
Tool status
Info
General documents
Sitemap
User access
Login
Electrum
NanoLund
Chalmers
Ångström
MyFab - The Swedish Micro and Nano Fabrication Network
No access?
Apply for access
here...
Login
U
sername:
P
assword:
User Name is required.
Password is required.
Forgot your password?
ICPCVD (538)
Current status:
AVAILABLE
Book
|
Log
|
Show/Collapse all
Responsibles
1st Responsible:
Magnus Lindberg
2nd Responsible:
Reza Nikpars
Files
You must be logged in to view files.
Description
Details
Tool name:
ICPCVD
Area/room:
C-Q-Etch
Category:
Thin film deposition
Manufacturer:
Oxford Plasma Technology
Model:
PlasmaPro 100
Tool rate:
D
Instructors & Licensed Users
Instructors
Licensed Users
Tool Modes
You must be logged in to view tool modes.
This may take a while...please wait.
×
User Information
Name:
Telephone:
Mobile:
E-mail:
University/Company:
Laboratory:
Send Message
Subject:
Message:
Send