Picture of Wetb Si strip
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Arman Sikiric
2nd Responsible:
Files
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Description

Technical description

Full equipment name: Wet bench developer W16
General purpose: Photoresist processing
Technical data:
• Acetone photoresist strip bath (coarse clean)
• Acetone photoresist strip bath (fine clean)
• Propanol bath
• Developer bath
• Bubbler
• Quick dump
• Manual working place/solvent drain
• DIWater gun
• Nitrogen gun

Details
Tool name:
Wetb Si strip
Area/room:
C-Gul 1
Category:
Wet process benches
Manufacturer:
Wet bench developer
Model:
Photoresist processing.
Tool rate:
A
Instructors & Licensed Users

Instructors

Licensed Users

Tool Modes
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