Technical description

Full equipment name: Wet bench lift off W32
General purpose: Metal Lift-Off with Ultrasonic bath
Technical data:
• Chemicals: Acetone
• Ultrasonic bath and drain for solvents
• DI Water gun
• Nitrogen gun

Full equipment name: Wet bench GaAs solvent cleaning W33
General purpose: Photoresist stripping and cleaning of GaAs wafers
Technical data:
• Chemicals: Acetone, 2-propanol
• Ultrasonic bath
• Acetone photoresit strip bath (coarse clean)
• Acetone photoresist strip bath (fine clean)
• Propanol bath
• Bubbler
• Manual working place/solvent drain
• Nitrogen gun