Applications

• Phase analysis of samples with flat or irregular surfaces; of thin films.
• Quantitative phase analysis on batches of samples.
• Crystallography and Rietveld analysis on samples with flat or irregular surfaces; or powder samples in glass capillaries.
• Transmission measurements through (samples between) foils.
• High resolution rocking curve analysis, reciprocal space mapping and X-ray topography on (epitaxial) layers on single crystal substrates.
• Reflectometry on thin layers and substrate materials.
• In-plane diffraction on thin films.
• Residual stress analysis of flat samples, irregularly shaped materials or thin films.
• Texture analysis on all kinds of materials with a preferred orientation of the crystallites.
• Analysis of changes in the crystal structure in changing environmental conditions.
• High-throughput X-ray diffraction for automated analyses of large numbers of samples.

Restrictions:  use of harmful, flammable or other substances which contaminate set-up with powdering, liquid or vapor  is strongly prohibited.

Powder samples have to be prepared for measurement in the FNM Chemistry Lab

(contact Abdualam Uheida  - salam@kth.se  087909132).

       Any manipulation with powder are not allowed in XRD Lab!