Technical description
Full equipment name: Wet Bench Al Etch W39
General purpose: Cleaning or etching wafers/samples from aluminium
Technical data:
• Wet bench for 4 inch substrates
• Chemicals: Phosphoric acid (H3PO4)
• Heated acid bath (PVDF) with drain & circulation pump (1)
• Bubbler (2)
• Cassettes, cassette holders and single wafer holders with blue markings