Technical description

Full equipment name: LabSpin 8
General purpose: Coating samples with standard photoresist films. NOT PDMS or other non-soluble photoresist. 
Technical data:
• Wafer size up to 8”
• Spin speed range: 100 – 6000 rpm
• Spin time range: 0 - 999 seconds
• Interlock switch to protect spinning without vacuum