Technical description

Full equipment name: Wet Bench HF Clean W06
General purpose: Cleaning of substrates prior to furnace processes
Technical data:
• Two PVDF bath without heating.
• Quick dump bath
• Bubbler
• DI water gun
• Cassettes, cassette holders and single wafer holders marked red.

Full equipment name: Wet bench HF doped W07
General purpose: Cleaning of substrates after doping processes
Technical data:
• Two PVCF baths without heating
• Nitrogen gun
• Aspirator
• DI Water (svanhals)
• Manual workplace
• Cassettes, cassette holders and single wafer holders marked double red.