Picture of Wetb-Si epi-clean
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Arman Sikiric
2nd Responsible:
Per-Erik Hellström
Files
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Description

Technical description
Full equipment name: Wet bench Diffusion Clean
General purpose: Cleaning of substrates prior to furnace processes.
Technical data:
Seven up
• Two PFA bath without heating
• One bubbler
• Cassettes, cassette holders and single wafer holders marked red

IMEC
• One PP bath
• One aspirator
• One Di water gun
• One N2 gun
• Cassettes, cassette holders and single wafer holders marked red

Details
Tool name:
Wetb-Si epi-clean
Area/room:
C-Epitaxy
Category:
Wet process benches
Manufacturer:
Wet bench Clean
Model:
Wet bench Clean and IMEC
Tool rate:
A
Instructors & Licensed Users

Instructors

Licensed Users

Process Lines
TEST-perw
Tool Modes
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