Picture of W0607
Current status:
AVAILABLE
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Technical description

Full equipment name: Wet Bench HF Clean W06
General purpose: Cleaning of substrates prior to furnace processes
Technical data:
• Two PVDF bath without heating.
• Quick dump bath
• Bubbler
• DI water gun
• Cassettes, cassette holders and single wafer holders marked red.

Full equipment name: Wet bench HF doped W07
General purpose: Cleaning of substrates after doping processes
Technical data:
• Two PVCF baths without heating
• Nitrogen gun
• Aspirator
• DI Water (svanhals)
• Manual workplace
• Cassettes, cassette holders and single wafer holders marked double red.

Tool name:
W0607
Area/room:
C-Si-epi
Category:
Wet process benches
Manufacturer:
Wet bench HF clean
Model:
Wet bench HF clean and HF doped
Tool rate:
A
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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