Picture of Wetb-Si epi-clean
Current status:
AVAILABLE
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1st Responsible:
2nd Responsible:
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Technical description
Full equipment name: Wet bench Diffusion Clean
General purpose: Cleaning of substrates prior to furnace processes.
Technical data:
Seven up
• Two PFA bath without heating
• One bubbler
• Cassettes, cassette holders and single wafer holders marked red

IMEC
• One PP bath
• One aspirator
• One Di water gun
• One N2 gun
• Cassettes, cassette holders and single wafer holders marked red

Tool name:
Wetb-Si epi-clean
Area/room:
C-Si-epi
Category:
Wet process benches
Manufacturer:
Wet bench Clean
Model:
Wet bench Clean and IMEC
Tool rate:
A
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

Instructors

Licensed Users

TEST-perw
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