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Current status:
AVAILABLE
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Instructors: Roger Wiklund (08/632 7817)


 

Technical descriptionFull equipment name: Commonwealth Scientific Corporation Ion Beam Sputtering Tool
General purpose: Deposition of metals, metal alloys, semiconductors and dielectric films by the sputter process
Technical data:
• Base Pressure: 6E-6 Torr
• Process Press. Range: 2,0 – 5,0E-4 Torr
• Ion Source Gas: Ar
• 10” Target Positions: 4
• Substrate Chucks/Planets: 3,5 cm & 2”, 4”, 6”
• Computer: IBM7585 PO2 Industrial Computer
• Cryopump: CTI – 10
• Cryocompressor: CTI – 8510
• Mech. Pump: Pfeiffer Duo 065D
• Motor Drivers: Compumotor SX6 (2 items)
• Power Supply: CSC – IBS 1200 (16 cm Ion Source)
• Power Supply: CSC – MARK II (Wafer Preclean Ion Source)
• Power Supply: CSC – PBN (Plasma Bridge Neutralizer Ion Source)
 

 

 

 

 

Tool name:
IBS
Area/room:
C-Metal-III/V
Category:
Thin film deposition
Manufacturer:
Commonwealth Scientific Corporation
Model:
Ion Beam Sputtering Tool
Tool rate:
D
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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