Picture of Nils
Current status:
AVAILABLE
Book | Log
Show/Collapse all

1st Responsible:
2nd Responsible:
You must be logged in to view files.

Technical description
Full equipment name: EVG 620 UV Nanoimprint Lithography
General purpose:Patterning of samples using UV NIL
Technical data:
• 350 W exposure lamp, Hg (maximum 1000W)
• Allowed substrates: 6, 4, 3, 2 inch and wafer pieces
• NIL stamp holder allows 4 inch stamps, boths hard and soft (PDMS) type
• Wafer thickness up to 6 mm
• May be aven used as mask aligner
• Alignment:
Range X,Y +/- 5 mm
Rotation: Theta +/- 3.5 deg
Resolution 0.06 µm (NIL)
Alignment accuracy: 0.5 µm (with 20x objective)
Top side microscope: 10x
 

Tool name:
Nils
Area/room:
C-Gul 3
Category:
Lithography
Manufacturer:
EVG
Model:
620 UV Nanoimprint Lithography
Tool rate:
C
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

Instructors

Licensed Users

You must be logged in to view tool modes.