Picture of Labspin80
Current status:
AVAILABLE
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Technical description

Full equipment name: LabSpin 8
General purpose: Coating samples with standard photoresist films. NOT PDMS or other non-soluble photoresist. 
Technical data:
• Wafer size up to 8”
• Spin speed range: 100 – 6000 rpm
• Spin time range: 0 - 999 seconds
• Interlock switch to protect spinning without vacuum

Tool name:
Labspin80
Area/room:
C-Gul 3
Category:
Lithography
Manufacturer:
Suss Microtec
Model:
Labspin8-BM
Tool rate:
B
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:
3

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