Picture of CPD
Current status:
AVAILABLE
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Technical description
 

Full equipment name: Tousimis Automegasamdri 938
 

General purpose: Automatic process cycle for drying upto five 1, 2, 4, 6 or 8 inch wafers per process run and multiple 10, 20, 30 mm chips per process run using super critical CO2.
 

Technical data: Sample medium used is Isopropanol.

Organic matter/Polymer is forbidden in CPD.

Tool name:
CPD
Area/room:
C-Wet Chemistry
Category:
Other processes
Manufacturer:
tousimis
Model:
Automegasamdris-938
Tool rate:
B
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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