Picture of Wetb Al etch
Current status:
AVAILABLE
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Technical description
Full equipment name: Wet Bench Al Etch W39
General purpose: Cleaning or etching wafers/samples from aluminium
Technical data:
• Wet bench for 4 inch substrates
Chemicals: Phosphoric acid (H3PO4)
• Heated acid bath (PVDF) with drain & circulation pump (1)
• Bubbler (2)
• Cassettes, cassette holders and single wafer holders with blue markings

Tool name:
Wetb Al etch
Area/room:
C-Wet Chemistry
Category:
Wet process benches
Manufacturer:
Wet bench
Model:
Etching
Tool rate:
A
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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