Picture of MLA150 Albanova
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Maskless photolithography system, from Heidelberg Instruments GmbH model MLA150 with "Write Mode I".  

Min. feature size 500 nm
375nm ~3W diode laser
5 to 150 mm2 substrate size
500 nm overlay accuracy
1000 nm backside alignment accuracy
<35min exposure time for 4'' wafer, writespeed >300 mm2/min (80 mJ/cm2 dose)  

 

TECHNICAL WEBSITE: 

https://www.nanophys.kth.se/nanolab/mla150/mla150.html

Tool name:
MLA150 Albanova
Area/room:
Albanova C1:3049
Category:
Lithography
Manufacturer:
Heidelberg Instruments GmbH
Model:
MLA150
Tool rate:
D
Max booking time, day:
4 hours
Max booking time, night:
16 hours
No. of future bookings:
4

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