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Tool name:
Testtool Electrum
Area/room:
Virtual
Category:
Metrology
Manufacturer:
Electrum lab
Model:
model 1
Tool rate:
A
Max booking time, day:
24 hours
Max booking time, night:
hours
No. of future bookings:

OXIDE ETCHING with Recipe: CH:A OXIDE TIME

Etch Rate (thermal oxide) ~ 140 nm/min
Etch Rate (PECVD SIO2HDR) = 174 nm/min

SiN ETCHING with Recipe: CH:A SiN TIME

Etch Rate (LPCVD SiN) ~ 95 nm/min
Etch Rate (PECVD SINLDR)= 142 nm/min

ALUMINIUM ETCHING with Recipe: CH:B Al ONLY

Etch Rate (Endura AL) ~ 600 nm/min

POLY-Si ETCHING with Recipe: CH:C STD POLY

Etch Rate ~ 270 nm/min

OXIDE DEPOSITION (PECVD T=400C)

CH:D SiO2LDR ~ 195 nm/min
CH:D SiO2HDR=783 nm/min

SiN DEPOSITION (PECVD T=400C)

CH:D SINLDR= 61 nm/min

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