Picture of RIBE
Current status:
AVAILABLE
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  Application: Ion Beam Etching, Reactive Ion Beam Etching, Chemically Assisted Ion Beam Etching.

  • Stainless steel chamber pumped by a Pfeiffer 1500 turbo pump and backed by an Adixen A103P Rotary pump. Base pressure ~5.5E-08 Torr.
  • Automatic loadlock pumped by an Alcatel ATP80 turbo pump backed by an Adixen ACP15G rotary pump.
  • 15cm 1.25kW etch RF ion source, with three circular etch grids.
  • 200 mm platen with variable rotation speed (max 20 rpm).
  • Tiltable substrate holder can be angled from -90° (loading position) to +8°.
  • Fluid- cooled rotating specimen holder with shutter.
  • Helium wafer backside cooling.
  • Platen heating up to 250°C and cooling down to 10°C.
  • Gas pod with Ar, CF4, O2, CHF3, N2, H2, CH4, Cl2, BCl3 and SiCl4 lines.
  • Manually retractable SIMS probe with valve, pumped by an Alcatel ATP80 turbo pump, backed by an Adixen ACP15G rotary pump.
  • Verity optical endpoint detection system mounted on platen itself.
Tool name:
RIBE
Area/room:
C-RIBE
Category:
Dry etching
Manufacturer:
Oxford Instruments Plasma Technology
Model:
Ionfab 300 plus
Tool rate:
D
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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