Picture of RIE ICP O2/AR Albanova
Current status:
AVAILABLE
Book | Log
Show/Collapse all

1st Responsible:
2nd Responsible:
You must be logged in to view files.

Oxford Plasmalab 80+ RIE w. ICP.

Gases: oxygen and argon.

More info here.

Tool name:
RIE ICP O2/AR Albanova
Area/room:
Albanova C1:3052
Category:
Dry etching
Manufacturer:
Oxford
Model:
Plasmalab 80+
Tool rate:
D
Max booking time, day:
2 hours
Max booking time, night:
6 hours
No. of future bookings:
3

Instructors

Licensed Users

You must be logged in to view tool modes.