Ebeam lithography system, Raith Voyager.
50 kV acc. voltage (fixed). Laserinterferometric table gives stitching error < 20 nm (3 sigma).
Overlay accuracy 20 nm (3 sigma).
Installed option FBMS (Fixed Beam Moving Stage) and MBMS (Modulated Beam Moving Stage) gives possibility of stitch error free patterning over large areas. Current sample holder accomodates sample sizes up to two inch
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