Technical description
Full equipment name: Diener PICO RF
General purpose: Low Pressure Plasma Etcher
Technical data:
• Reactor size:
  - Deep approx 315 mm
  - Diameter approx 150 mm
• Reactor volume Approx. 5 L
• Reactor material:
  - Chamber wall: stainless steel
  - Door: aluminium
• High frequency generator: 135.56 MHz, 300 W
• Working pressure: Approx. 0,2-1 mbar
• Pressure measuring: Pirani
• Gas line: 2
• Operating: Manual
• Electrode: 1
• Power: 230 V/ 16 A
• Power Approx.500 W ( without pump )