Picture of Plasmatvätt Pico
Current status:
AVAILABLE
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Technical description
Full equipment name: Diener PICO RF
General purpose: Low Pressure Plasma Etcher
Technical data:
• Reactor size:
  - Deep approx 315 mm
  - Diameter approx 150 mm
• Reactor volume Approx. 5 L
• Reactor material:
  - Chamber wall: stainless steel
  - Door: aluminium
• High frequency generator: 135.56 MHz, 300 W
• Working pressure: Approx. 0,2-1 mbar
• Pressure measuring: Pirani
• Gas line: 2
• Operating: Manual
• Electrode: 1
• Power: 230 V/ 16 A
• Power Approx.500 W ( without pump )
 

Tool name:
Plasmatvätt Pico
Area/room:
C-Hybridisering
Category:
Dry etching
Manufacturer:
Diener PICO RF
Model:
Low pressure plasma etcher
Tool rate:
B
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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