Picture of W3233
Current status:
AVAILABLE
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Technical description

Full equipment name: Wet bench lift off W32
General purpose: Metal Lift-Off with Ultrasonic bath
Technical data:
• Chemicals: Acetone
• Ultrasonic bath and drain for solvents
• DI Water gun
• Nitrogen gun

Full equipment name: Wet bench GaAs solvent cleaning W33
General purpose: Photoresist stripping and cleaning of GaAs wafers
Technical data:
• Chemicals: Acetone, 2-propanol
• Ultrasonic bath
• Acetone photoresit strip bath (coarse clean)
• Acetone photoresist strip bath (fine clean)
• Propanol bath
• Bubbler
• Manual working place/solvent drain
• Nitrogen gun

Tool name:
W3233
Area/room:
C-Q-Etch
Category:
Wet process benches
Manufacturer:
Wet bench
Model:
Wet bench lift off.
Tool rate:
A
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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