Picture of W2631
Current status:
AVAILABLE
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Technical description

Full equipment name: Wet bench spray etch (GaAs) W30
General purpose: Etching of GaAs wafers with H2O2 and NH3
Technical data:
• Chemicals: Ammonia (NH4OH), Hydrogen Peroxide (H2O2)
• Spray etch bath
• Bubbler
• DI Water gun
• Manual working place/solvent drain
• Nitrogen gun

Full equipment name: Wet bench GaAs etch W31
General purpose: Etching of GaAs wafers with and HCl
Technical data:
• Chemicals: Hydrochloric Acid (HCl)
• Acid etch bath and drain for acids
• Bubbler
• DI Water gun
• Manual working place/solvent drain
• Nitrogen gun
 

Tool name:
W2631
Area/room:
C-Q-Etch
Category:
Wet process benches
Manufacturer:
Wet bench
Model:
Wet bench spray etch (GaAs).
Tool rate:
A
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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